Samsung patents exhaust system that splits dust before burning waste gas
This patent describes an exhaust system for semiconductor factories that uses a buffer chamber to separate waste gas powder into small and large particles before the gas is burned. The system then uses a wet tower with cleaning water to break down the remaining powder. The design aims to manage waste more effectively during chip manufacturing.
In the filing’s own words
An exhaust system including a process chamber in which a semiconductor processing is performed, a buffer connected to the process chamber, the buffer configured to receive waste gas generated during the semiconductor processing and dualize and disperse powder generated from the waste gas may be provided, a reactor configured to burn the waste gas, a wet tank connected to the reactor, arranged below the reactor, and configured to store cleaning water, and a wet tower configured to decompose the powder in the waste gas by using the cleaning water may be provided.
What exactly they claim (claim 1)
1. An exhaust system comprising: a process chamber in which a semiconductor processing is performed; a buffer connected to the process chamber, the buffer configured to receive waste gas generated during the semiconductor processing and dualize powder generated from the waste gas into a first powder having a relatively small particle size and a second powder having a relatively large particle size, the buffer including an internal space divided into a lower internal space and an upper internal space, the buffer further including an inlet, a first outlet, and a second outlet, the inlet being on one side of the buffer, the first outlet and the second outlet being on upper and lower portions of an opposite side of the buffer, respectively, the first outlet in communication with the upper internal space of the internal space and configured to output the first powder and the second outlet in communication with the lower internal space of the internal space and configured to output the second powder; a reactor configured to burn the waste gas; a wet tank connected to the reactor, arranged below the reactor, and configured to store cleaning water; and a wet tower configured to decompose the powder in the waste gas by using the cleaning water.
Facts
- Company
- Samsung (Samsung Electronics Co., Ltd.)
- Official title
- Exhaust system and exhaust method using buffer
- Patent number
- US12746501B2
- Application number
- 18471652
- Filed
- Sep 21, 2023
- Granted
- Sep 29, 2026
- Inventors
- 1
- Claims
- 18
Classified under
B01D 47/06 Operations & transportB01D 50/00 Operations & transportB01D 53/005 Operations & transportB01D 53/75 Operations & transportC23C 16/4412 Chemistry & metalsB01D 53/58 Operations & transportMore from Samsung in Materials & manufacturing
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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.