Samsung patents laser method for cutting semiconductor test samples
Samsung describes a technique for creating small test pieces from a full, uncut silicon wafer using a laser beam. The process involves adding a protective coating, using the laser to remove specific sections of the wafer and coating, and then cleaning away any remaining material.
In the filing’s own words
Provided is a method of manufacturing a sample, the method including preparing an uncut wafer, and manufacturing a sample by emitting a laser beam onto the uncut wafer, wherein the manufacturing of the sample includes forming a passivation layer on the wafer, removing at least a portion of each of the wafer and the passivation layer, and removing a residual passivation layer.
What exactly they claim (claim 1)
1. A method of manufacturing a sample, the method comprising: preparing an uncut wafer; and manufacturing a sample by emitting a laser beam onto the uncut wafer, wherein the manufacturing of the sample comprises: forming a passivation layer on the wafer; removing at least a portion of each of the wafer and the passivation layer; and removing a residual passivation layer.
Facts
- Company
- Samsung (SAMSUNG ELECTRONICS CO., LTD.)
- Official title
- APPARATUS AND METHOD OF MANUFACTURING SAMPLE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE APPARATUS AND METHOD
- Publication number
- US20260334166A1
- Application number
- 19468474
- Filed
- Feb 3, 2026
- Published
- Oct 22, 2026
- Inventors
- 4
- Claims
- 20
Classified under
H10P 74/203 Electricity & electronicsB23K 26/032 Operations & transportB23K 26/042 Operations & transportB23K 26/364 Operations & transportH10P 54/20 Electricity & electronicsH10P 54/92 Electricity & electronicsMore from Samsung in Chips & hardware
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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.
