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Samsung patents chip design with curved layers to cut power waste

Patent drawing
Patent drawing from the official filing.

Samsung describes an integrated circuit where the channel layers, made of a material called transition metal dichalcogenide, are shaped with curved bumps instead of being flat. The design also leaves a specific gap between the gate and the source/drain area without filling it with insulating material to reduce unwanted electrical interference.

Why it mattersThis approach aims to make computer chips more efficient by reducing parasitic capacitance, which is a common source of power loss in advanced processors.

In the filing’s own words

Provided are an integrated circuit device and a method of manufacturing the same, wherein, in the integrated circuit device, a curved channel layer is arranged to improve electrical characteristics, and a gate insulating material is not formed in an inner spacer formed on sidewalls of a source/drain region, and thus parasitic capacitance is reduced.

What exactly they claim (claim 1)

1. An integrated circuit device comprising: an active region extending in a first horizontal direction on a substrate; a plurality of channel layers apart from each other on the active region in a vertical direction, and extending in the first horizontal direction; oxide layers under the plurality of channel layers, respectively; a gate line extending on the active region in a second horizontal direction crossing the first horizontal direction, and surrounding the plurality of channel layers and the oxide layers; a source/drain region on the active region and in contact with the plurality of channel layers; and an inner spacer, wherein the inner spacer comprises: one sidewall in contact with a sidewall of the source/drain region; another sidewall opposite the one sidewall and on a sidewall of the gate line; and an upper surface and a lower surface, each in contact with the plurality of channel layers, wherein the plurality of channel layers comprise a transition metal dichalcogenide (TMD) compound, and wherein each of the plurality of channel layers comprises a plurality of convex curved units in the vertical direction.

Facts

Company
Samsung (SAMSUNG ELECTRONICS CO., LTD.)
Official title
INTEGRATED CIRCUIT DEVICE
Publication number
US20260314048A1
Application number
19337121
Filed
Sep 23, 2025
Published
Oct 8, 2026
Inventors
4
Claims
20

Classified under

H10D 84/832 Electricity & electronicsH10D 30/43 Electricity & electronicsH10D 30/481 Electricity & electronicsH10D 30/503 Electricity & electronicsH10D 62/102 Electricity & electronicsH10D 62/121 Electricity & electronics

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.