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Samsung patents chip washing system that filters dirty liquid

Samsung has filed a patent for a machine that cleans computer chips by spinning them while spraying a chemical solution. The system uses a filter to separate the liquid, sending the dirtier parts out for disposal and recycling the cleaner parts back to the machine.

Why it mattersThis improves the efficiency of chip manufacturing by reusing cleaning fluids, which is a standard practice in industrial production.

In the filing’s own words

An apparatus and method for processing a substrate can reduce the concentration of process by-products in a chemical solution. The apparatus includes a substrate rotating device configured to rotate a seated substrate in a spinning manner, a chemical solution supply device configured to supply a chemical solution to the substrate, a chemical solution discharge line configured to discharge the chemical solution having undergone a process to an outside, a chemical solution circulation line configured to circulate the chemical solution having undergone the process to the chemical solution supply device, and a discharged chemical solution selection device configured to discharge a chemical solution containing a first amount of process by-products to the outside through the chemical solution discharge line and to circulate a chemical solution containing a second amount of process by-products through the chemical solution circulation line, wherein the first amount of process by-products is larger than the second amount of process by-products.

What exactly they claim (claim 1)

1. A method of processing a substrate, the method comprising: (a) rotating a seated substrate in a spinning manner; (b) supplying a chemical solution to the substrate using a chemical solution supply device; and (c) discharging the chemical solution containing a first amount of process by-products after a process to an outside through a chemical solution discharge line and circulating the chemical solution containing a second amount of process by-products through a chemical solution circulation line; wherein the first amount of process by-products is larger than the second amount of process by-products.

Facts

Company
Samsung (SAMSUNG ELECTRONICS CO., LTD.)
Official title
APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
Publication number
US20260293576A1
Application number
19693813
Filed
Jun 1, 2026
Published
Sep 24, 2026
Inventors
9
Claims
8

Classified under

H10P 72/0424 Electricity & electronicsH10P 50/642 Electricity & electronics

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.