Samsung patents new chemical mix for making finer computer chips
Samsung has filed a patent for a specific type of photoresist, which is a light-sensitive material used to draw tiny circuits on silicon wafers. The filing describes a polymer structure with specific chemical bonds that help create precise patterns during the chip manufacturing process.
In the filing’s own words
An example chemically amplified photoresist composition and an example method for manufacturing a semiconductor device using the same are provided. The photosensitive polymer comprises a first repetition unit represented by any one of chemical formula 1a, chemical formula 1b, and chemical formula 1c, and each of the chemical formula 1a, the chemical formula 1b, and the chemical formula 1c includes an ester bond.
What exactly they claim (claim 1)
1. A photosensitive polymer comprising: a first repetition unit represented by any one of chemical formula 1a, chemical formula 1b, and chemical formula 1c, wherein each chemical formula of the chemical formula 1a, the chemical formula 1b and the chemical formula 1c includes an ester bond, wherein the chemical formula 1a is wherein the chemical formula 1b is wherein the chemical formula 1c is wherein R 1a is a trivalent linking group having 1 to 20 carbon atoms, wherein each of R 1b, R 2b, and R 3b is an independent divalent linking group having 3 to 20 carbon atoms including a tertiary carbon directly bonded to an oxygen atom of the ester bond, wherein R 1c is a single bond or a divalent linking group having 1 to 20 carbon atoms, and wherein each of R 2a and R 3a is independently a hydrogen atom, a hydroxyl group, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted alkenyl group having 2 to 10 carbon atoms, a substituted or unsubstituted alkynyl group having 2 to 10 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 3 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 20 carbon atoms, a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, a substituted or unsubstituted aryl alkyl group having 6 to 18 carbon atoms, or a halogen atom.
Facts
- Company
- Samsung (Samsung Electronics Co., Ltd.)
- Official title
- PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
- Publication number
- US20260288005A1
- Application number
- 19555198
- Filed
- Mar 3, 2026
- Published
- Sep 24, 2026
- Inventors
- 2
- Claims
- 20
Classified under
G03F 7/0392 Physics & computingG03F 7/0045 Physics & computingH10P 14/683 Electricity & electronicsH10P 50/692 Electricity & electronicsH10P 50/71 Electricity & electronicsH10P 50/73 Electricity & electronicsMore from Samsung in Chips & hardware
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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.