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Samsung patents electron beam method to check chip layer alignment

Samsung describes a system that uses an electron beam to inspect tiny alignment marks on semiconductor wafers. It analyzes the resulting images to calculate how well different layers of the chip are stacked on top of each other.

Why it mattersThis improves the precision of chip manufacturing by offering a new way to detect misalignment during production.

In the filing’s own words

An overlay measuring system includes an electronic optical system configured to irradiate an electron beam onto a sample on which an overlay mark having designed overlay values is formed, and configured to detect electrons emitted from the sample, and a processor configured to acquire a voltage contrast image of the overlay mark from the electrons detected by the electronic optical system. The processor is configured to obtain a defect function from voltage contrast image data of the voltage contrast image, the defect function changing according to the designed overlay values, and is configured to perform self-cross correlation on the defect function to determine an overlay.

What exactly they claim (claim 1)

1. An overlay measuring system, comprising: an electronic optical system configured to irradiate an electron beam onto a sample on which an overlay mark having designed overlay values is formed, and configured to detect electrons emitted from the sample; and a processor configured to acquire a voltage contrast image of the overlay mark from the electrons detected by the electronic optical system, wherein the processor is configured to obtain a defect function from voltage contrast image data of the voltage contrast image, the defect function changing according to the designed overlay values, and is configured to perform self-cross correlation on the defect function to determine an overlay.

Facts

Company
Samsung (Samsung Electronics Co., Ltd.)
Official title
OVERLAY MEASURING METHOD AND SYSTEM, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME
Publication number
US20260276375A1
Application number
19674581
Filed
May 12, 2026
Published
Sep 17, 2026
Inventors
8
Claims
20

Classified under

G01B 15/00 Physics & computing

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.