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SamsungPatent applicationChips & hardwareInterest 6/10

Samsung patents chemical mix for making finer chip patterns

Samsung has filed a patent for a liquid mixture designed to create a protective layer on semiconductor wafers. The composition uses specific chemical compounds to help form extremely small patterns during the manufacturing of computer chips.

Why it mattersThis filing focuses on the chemical materials used to build smaller and more precise semiconductor devices, which is a key area for improving computer performance.

In the filing’s own words

Provided are a composition including a solvent and a protection layer-forming material, a method of preparing a fine pattern by using the same, and a method of manufacturing a semiconductor device by using the same. The protection layer-forming material may include a compound represented by Formula 1 below: For descriptions of Formula 1, refer to the specification.

What exactly they claim (claim 1)

1. A composition comprising: a solvent; and a protection layer-forming material, wherein the protection layer-forming material comprises a compound represented by Formula 1 below, wherein in Formula 1, X 1 and X 2 are each independently O or S, R 1 and R 2 are each independently a C 1 -C 30 alkyl group, a C 2 -C 30 alkenyl group, a C 3 -C 10 cycloalkyl group, a C 2 -C 10 heterocycloalkyl group, a C 6 -C 30 aryl group, or a C 2 -C 30 heteroaryl group, wherein, in R 1 and R 2, at least one hydrogen is optionally substituted with a halogen atom, a C 1 -C 30 alkyl group, *—O(Q 1), *—NH 2, *—NH(Q 1), or *—N(Q 1)(Q 2), wherein Q 1 and Q 2 are each independently a C 1 -C 30 alkyl group, or a C 6 -C 30 aryl group, wherein, in Q 1 and Q 2, at least one hydrogen is optionally substituted with a halogen atom, a C 1 -C 30 alkyl group, a C 1 -C 30 alkoxy group, an amino group, a (C 1 -C 10 alkyl)amino group, or a di(C 1 -C 10 alkyl)amino group, and * is a bonding site with a neighboring atom.

Facts

Company
Samsung (Samsung Electronics Co., Ltd.)
Official title
COMPOSITION, METHOD OF PREPARING FINE PATTERN BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME
Publication number
US20260275125A1
Application number
19441161
Filed
Jan 6, 2026
Published
Sep 17, 2026
Inventors
9
Claims
20

Classified under

C09D 5/24 Chemistry & metalsC09D 7/20 Chemistry & metalsH10W 20/056 Electricity & electronicsH10W 20/0765 Electricity & electronicsH10W 20/42 Electricity & electronicsH10W 20/4405 Electricity & electronics

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.