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Samsung patents chip design with stacked contacts for better wiring

Samsung describes a semiconductor device layout where the electrical connections to the chip's control gate and data channels are arranged in a specific stacked configuration. The design uses a lower contact and an upper contact for the data channels, allowing wiring to connect to different levels within the chip structure.

Why it mattersThis is a routine improvement in chip manufacturing that helps engineers pack more components into smaller spaces, which is standard practice for making processors faster and more efficient.

In the filing’s own words

A semiconductor device includes an active pattern extending on a substrate in a first direction; a gate structure extending on the active pattern in a second direction, the gate structure intersecting the first direction, the gate structure including a gate electrode; a source/drain pattern on at least one side of the gate structure; a source/drain contact including a lower contact and an upper contact protruding from a region of the lower contact on the source/drain pattern; a gate contact on a region of the gate electrode; an insulating molding layer covering the source/drain contact, the gate structure, and the gate contact; and an interconnection line on the insulating molding layer, the interconnection line having a first via connected to the upper contact of the source/drain contact and a second via connected to the gate contact.

What exactly they claim (claim 1)

1. A semiconductor device, comprising: an active pattern extending on a substrate in a first direction; a gate structure extending on the active pattern in a second direction, the gate structure intersecting the first direction, the gate structure including a gate electrode; a source/drain pattern on at least one side of the gate structure; a source/drain contact including a lower contact on the source/drain pattern and an upper contact protruding from a region of the lower contact; a gate contact on a first region of the gate electrode; an insulating molding layer covering the source/drain contact, the gate structure, and the gate contact; and an interconnection line on the insulating molding layer, the interconnection line having a first via connected to the upper contact of the source/drain contact and a second via connected to the gate contact.

Facts

Company
Samsung (Samsung Electronics Co., Ltd.)
Official title
SEMICONDUCTOR DEVICES
Publication number
US20260271382A1
Application number
19531204
Filed
Feb 5, 2026
Published
Sep 10, 2026
Inventors
4
Claims
20

Classified under

H10D 84/832 Electricity & electronicsH10D 30/503 Electricity & electronicsH10D 62/151 Electricity & electronicsH10D 64/256 Electricity & electronicsH10D 64/518 Electricity & electronicsH10D 64/62 Electricity & electronics

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.