Samsung patents image sensor design with air gaps to separate pixels
Samsung describes an image sensor structure where deep trenches separate individual pixel areas. The design uses layers of insulating material and specific air gaps within these trenches to isolate the pixels from one another.
In the filing’s own words
An image sensor includes a substrate that includes a trench that defines pixel regions and a deep isolation pattern provided between the pixel regions and in the trench. The deep isolation pattern includes first and second insulating liner patterns disposed on first and second inner side surfaces of the trench, first and second lower insulating patterns disposed on lower inner side surfaces of the first and second insulating liner patterns and an isolation pattern provided between the first and second lower insulating patterns and that extends through the substrate. The deep isolation pattern further includes a first air gap region that is a space enclosed by the first insulating liner pattern, the first lower insulating pattern, and the isolation pattern, and a second air gap region that is a space between the second insulating liner pattern, the second lower insulating pattern, and the isolation pattern.
What exactly they claim (claim 1)
1. An image sensor, comprising: a substrate that includes a trench that defines a plurality of pixel regions; and a deep isolation pattern provided between the pixel regions and in the trench, wherein the deep isolation pattern comprises: a first insulating liner pattern disposed on a first inner side surface of the trench; a second insulating liner pattern disposed on a second inner side surface of the trench; a first lower insulating pattern disposed between the first and second insulating liner patterns and adjacent to the first insulating liner pattern; a second lower insulating pattern disposed between the first and second insulating liner patterns and adjacent to the second insulating liner pattern; an isolation pattern provided between the first and second lower insulating patterns and that extends through the substrate; a first air gap region that is a space enclosed by the first insulating liner pattern, the first lower insulating pattern, and the isolation pattern; and a second air gap region that is a space enclosed by the second insulating liner pattern, the second lower insulating pattern, and the isolation pattern.
Facts
- Company
- Samsung (SAMSUNG ELECTRONICS CO., LTD.)
- Official title
- Image sensor
- Patent number
- US12772588B2
- Application number
- 17933747
- Filed
- Sep 20, 2022
- Granted
- Oct 20, 2026
- Inventors
- 2
- Claims
- 20
Classified under
H10F 39/807 Electricity & electronicsH10F 39/011 Electricity & electronicsH10F 39/182 Electricity & electronicsH10F 39/8053 Electricity & electronicsH10F 39/8063 Electricity & electronicsMore from Samsung in Chips & hardware
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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.