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Samsung patents new polymer for chip-making photoresists

Patent drawing
Patent drawing from the official filing.

Samsung has been granted a patent for a specific type of polymer used in photoresist, a material essential for creating microcircuits on computer chips. The invention describes a chemical structure that includes a sensitizer group and a protection group to help control how the material reacts to light during manufacturing.

Why it mattersThis is a routine improvement in semiconductor manufacturing chemistry that helps refine the process of etting tiny circuits onto silicon wafers.

In the filing’s own words

A polymer for photoresist and a photoresist composition including the polymer. The polymer for photoresist may include a polymerization unit comprising a sensitizer, and a protection group. The polymerization unit may include a structure of chemical formula 1: wherein R1 is hydrogen, a halogen element, a methyl group, a trifluoromethyl group, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, or a substituted or unsubstituted arylalkyl group having 6 to 18 carbon atoms, and n is an integer of 1 to 100,000.

What exactly they claim (claim 1)

1. A polymer for photoresist, the polymer comprising: a first polymerization unit comprising a sensitizer group; and a protection group, wherein the first polymerization unit comprises a structure of chemical formula 1: wherein R 1 is hydrogen, a halogen element, a methyl group, a trifluoromethyl group, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted aryl group having 6 to 18 carbon atoms, or a substituted or unsubstituted arylalkyl group having 6 to 18 carbon atoms, and n is an integer of 1 to 100,000; and wherein the first polymerization unit further comprises at least one of a unit of chemical formula 3 and a unit of chemcial formula 4: 1 is an integer of 1 to 100,000, and k is an integer of 1 to 100,000.

Facts

Company
Samsung (Samsung Electronics Co., Ltd.)
Official title
Polymers for photoresist and photoresist compositions including the same
Patent number
US12761560B2
Application number
17826234
Filed
May 27, 2022
Granted
Oct 13, 2026
Inventors
7
Claims
16

Classified under

G03F 7/0397 Physics & computingC08F 214/18 Chemistry & metalsC08F 220/1806 Chemistry & metalsC08F 220/301 Chemistry & metalsC08F 226/02 Chemistry & metalsC08F 228/02 Chemistry & metals

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.