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Samsung patents triangular support shapes for vertical memory chips

Patent drawing
Patent drawing from the official filing.

Samsung has been granted a patent for a semiconductor design that uses triangular support structures to hold up vertical memory channels. The filing describes arranging these supports in a staggered pattern where the points of adjacent triangles do not line up directly, creating a specific geometric layout within the chip.

Why it mattersThis is a routine improvement to the physical structure of memory chips, likely aimed at optimizing space or stability in high-density storage components.

In the filing’s own words

A semiconductor device includes a gate electrode structure including gate electrodes spaced apart in a first direction perpendicular to an upper surface of a substrate, each gate electrode extending in a second direction parallel to the upper surface of the substrate, a memory channel structure, and a support pattern array including support patterns spaced apart in the second direction and a third direction crossing the second direction, wherein each support pattern has a shape including three vertices and three sides, and wherein a first vertex of a first support pattern closest to a second support pattern and a first vertex of the second support pattern closest to the first support pattern are not aligned in the third direction but have different positions in the second direction.

What exactly they claim (claim 1)

1. A semiconductor device comprising: a gate electrode structure including gate electrodes on a substrate, the gate electrodes being spaced apart from each other in a first direction substantially perpendicular to an upper surface of the substrate, each of the gate electrodes extending in a second direction substantially parallel to the upper surface of the substrate; a memory channel extending through the gate electrode structure on the substrate; and a support pattern array including support patterns, each of the support patterns extending through the gate electrode structure in the first direction, the support patterns spaced apart from each other in the second direction and a third direction substantially parallel to the upper surface of the substrate and crossing the second direction, wherein each of the support patterns has a shape including three vertices and three sides that connect the three vertices in a plan view to form a triangle, and at least one of the three sides is a convex curve toward an outside of the triangle, wherein the support pattern array includes a first support pattern and a second support pattern adjacent to each other in the third direction, and wherein a first vertex among the three vertices of the first support pattern that is closest to the second support pattern and a first vertex among the three vertices of the second support pattern that is closest to the first support pattern are not aligned in the third direction but have different positions from each other in the second direction.

Facts

Company
Samsung (Samsung Electronics Co., Ltd.)
Official title
Vertical memory devices
Patent number
US12757401B2
Application number
18616343
Filed
Mar 26, 2024
Granted
Oct 6, 2026
Inventors
4
Claims
20

Classified under

H10B 43/27 Electricity & electronicsH10B 41/27 Electricity & electronicsH10B 43/10 Electricity & electronicsH10B 43/40 Electricity & electronicsH10B 43/50 Electricity & electronicsH10W 42/121 Electricity & electronics

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.