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Samsung patents stacked memory chip design with direct pad connections

Samsung describes a semiconductor memory device where a memory cell layer is stacked directly under a transistor layer. The two layers are joined by bonding pads that touch each other, creating a direct electrical path between the upper and lower sections.

Why it mattersThis design improves how memory chips are built by connecting layers directly, which is a standard method for making smaller and more efficient hardware.

In the filing’s own words

Disclosed are semiconductor devices and their fabrication methods. The semiconductor device comprises a lower substrate, a lower dielectric structure on the lower substrate, a memory cell structure between the lower substrate and the lower dielectric structure, a lower bonding pad in the lower dielectric structure, an upper dielectric structure on the lower dielectric structure, an upper substrate on the upper dielectric structure, a transistor between the upper substrate and the upper dielectric structure, and an upper bonding pad in the upper dielectric structure. A top surface of the lower bonding pad is in contact with a bottom surface of the upper bonding pad. The lower bonding pad and the upper bonding pad overlap the memory cell structure.

What exactly they claim (claim 1)

1. A semiconductor device, comprising: a lower substrate; a lower dielectric structure on the lower substrate; a memory cell structure between the lower substrate and the lower dielectric structure; a lower bonding pad in the lower dielectric structure; an upper dielectric structure on the lower dielectric structure; an upper substrate on the upper dielectric structure; a transistor between the upper substrate and the upper dielectric structure; and an upper bonding pad in the upper dielectric structure, wherein: a top surface of the lower bonding pad is in contact with a bottom surface of the upper bonding pad, and the lower bonding pad and the upper bonding pad overlap the memory cell structure, wherein the memory cell structure includes a cell gate structure, a cell capacitor, and a bit line between the cell gate structure and the cell capacitor, and wherein the upper bonding pad and the lower bonding pad overlap the bit line.

Facts

Company
Samsung (SAMSUNG ELECTRONICS CO., LTD.)
Official title
Bonded semiconductor memory device
Patent number
US12751020B2
Application number
18370940
Filed
Sep 21, 2023
Granted
Sep 29, 2026
Inventors
9
Claims
20

Classified under

H10B 80/00 Electricity & electronicsH10W 90/00 Electricity & electronicsH10W 80/312 Electricity & electronicsH10W 80/327 Electricity & electronicsH10W 90/297 Electricity & electronicsH10W 90/792 Electricity & electronics

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.