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Samsung patents chip-making tool that tunes plasma power in real time

Samsung has been granted a patent for a machine used to process thin sheets of material, such as silicon wafers, using plasma. The device includes a filter that automatically adjusts its electrical resistance to match changes in the power supply, ensuring the plasma stays stable during the manufacturing process.

Why it mattersThis improves the precision of semiconductor manufacturing, which is essential for making smaller and more efficient computer chips.

In the filing’s own words

Various example embodiments of the present disclosure provide a substrate processing apparatus including a chamber, an excitation power supply configured to generate a supply power for plasma excitation, a support inside the chamber configured to support a substrate, and a filter connected to the support. The filter is configured to change frequency characteristics of the supply power by changing an impedance of the filter based on a change in an output level of the excitation power supply.

What exactly they claim (claim 1)

1. A substrate processing apparatus comprising: a chamber; an excitation power supply configured to generate a supply power for plasma excitation; a support inside the chamber configured to support a substrate; a filter connected to the support; and a controller, wherein the controller is configured to change frequency characteristics of the supply power by changing an impedance of the filter with a timing that is based on a timing of a change in an output level of the excitation power supply.

Facts

Company
Samsung (Samsung Electronics Co., Ltd.)
Official title
Substrate processing apparatus
Patent number
US12738454B2
Application number
18769769
Filed
Jul 11, 2024
Granted
Sep 15, 2026
Inventors
8
Claims
20

Classified under

H01J 37/32174 Electricity & electronicsH01J 37/32091 Electricity & electronicsH01J 37/32724 Electricity & electronics

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.