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Samsung patents chip design with graded metal layer for better power flow

Samsung has been granted a patent for a semiconductor structure that improves how electricity reaches the core of a chip. The design uses a specific layer between the power line and the contact point that gradually changes in composition to reduce resistance.

Why it mattersThis is a technical improvement in chip manufacturing that helps ensure stable power delivery, which is essential for the performance of future processors.

In the filing’s own words

A semiconductor device may include a substrate including an active pattern, a source/drain pattern on the active pattern, an active contact on the source/drain pattern; a lower power line in the substrate, a lower contact that vertically connects the active contact to the lower power line, a conductive layer between the lower contact and the lower power line, and a power delivery network layer on a bottom surface of the substrate. The conductive layer may include silicon (Si) and a first element. The first element may include a transition metal or a metalloid. A concentration of the first element may decrease in a direction from the lower contact toward the lower power line.

What exactly they claim (claim 1)

1. A semiconductor device, comprising: a substrate including an active pattern; a source/drain pattern on the active pattern; an active contact on the source/drain pattern; a lower power line in the substrate; a lower contact that vertically connects the active contact to the lower power line; a conductive layer between the lower contact and the lower power line; and a power delivery network layer on a bottom surface of the substrate, wherein the conductive layer includes silicon (Si) and a first element, the first element includes a transition metal or a metalloid, and a concentration of the first element decreases in a direction from the lower contact toward the lower power line.

Facts

Company
Samsung (Samsung Electronics Co., Ltd.)
Official title
Semiconductor device and method of fabricating the same
Patent number
US12733476B2
Application number
18468317
Filed
Sep 15, 2023
Granted
Sep 8, 2026
Inventors
6
Claims
20

Classified under

H10W 20/20 Electricity & electronicsH10D 30/43 Electricity & electronicsH10D 30/6729 Electricity & electronicsH10D 30/6735 Electricity & electronicsH10D 30/6757 Electricity & electronicsH10D 62/121 Electricity & electronics

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.