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Samsung patents image sensor with vertical pixel structure

Samsung describes an image sensor design where the pixel structure extends vertically through the chip substrate. The filing details a specific transistor layout using a fin structure and a silicon-fluorine layer to manage electrical properties.

Why it mattersThis is a routine hardware improvement that focuses on the internal structure of camera sensors to potentially improve performance or efficiency.

In the filing’s own words

An image sensor includes a pixel division structure, a light sensing element, a transistor, a color filter array layer, and a microlens. The pixel division structure extends through a substrate in a vertical direction substantially perpendicular to an upper surface of the substrate, and defines unit pixel regions in which unit pixels are respectively formed. The light sensing element is formed in each of the unit pixel regions. The transistor is formed on the substrate. The color filter array layer is formed under the substrate, and includes color filters. The microlens is formed under the color filter array layer. The transistor includes a gate structure on an active fin protruding from the upper surface of the substrate and source/drain regions at portions of the active fin adjacent to the gate structure.

What exactly they claim (claim 1)

1. An image sensor comprising: a pixel division structure extending through a substrate in a vertical direction perpendicular to an upper surface of the substrate, the pixel division structure defining unit pixel regions in which unit pixels are respectively formed; a light sensing element in each of the unit pixel regions; a transistor on the substrate; a color filter array layer under the substrate, the color filter array layer including color filters; and a microlens under the color filter array layer, wherein the transistor comprises a gate structure on an active fin protruding from the upper surface of the substrate, and source/drain regions at portions of the active fin adjacent to the gate structure, and wherein the image sensor further comprises a silicon-fluorine layer at a portion of the active fin under the gate structure, or a polysilicon layer doped with fluorine between the gate structure and the active fin.

Facts

Company
Samsung (SAMSUNG ELECTRONICS CO., LTD.)
Official title
Image sensor
Patent number
US12733273B2
Application number
18074042
Filed
Dec 2, 2022
Granted
Sep 8, 2026
Inventors
4
Claims
20

Classified under

H10F 39/80373 Electricity & electronicsH10F 39/014 Electricity & electronicsH10F 39/182 Electricity & electronicsH10F 39/8053 Electricity & electronicsH10F 39/8063 Electricity & electronicsH10F 39/807 Electricity & electronics

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.