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Samsung patents method to optimize EUV light for chip manufacturing

Samsung has patented a method for setting up extreme ultraviolet (EUV) light systems used in making computer chips. The process uses computer simulations to test different light configurations and selects the best combination to improve how patterns are printed onto silicon wafers.

Why it mattersThis improves the precision of chip manufacturing, which is essential for creating faster and more efficient processors for phones and computers.

In the filing’s own words

Provided are a method of configuring an optimized extreme ultraviolet (EUV) illumination system, and an EUV exposure method using the EUV illumination system. The method of configuring the EUV illumination system includes calculating an aerial image by performing an optical simulation with respect to each of EUV point sources, summing up the aerial images based on EUV mapping, searching for a combination of the EUV point sources by using a fitness value with respect to the summed aerial image, and configuring the EUV illumination system as a combination of the EUV point sources, which has a maximum fitness value.

What exactly they claim (claim 1)

1. A method of configuring an extreme ultraviolet (EUV) illumination system, the method comprising: generating a library of independent aerial images, each of the aerial images being generated by performing an optical simulation with respect to each of a plurality of EUV point sources, each EUV point source corresponding to a respective optical path defined by an assignment between a field facet mirror (FFM) and a pupil facet mirror (PFM); performing an EUV mapping that defines combinations of the EUV point sources, wherein the EUV mapping corresponds to a predetermined condition of selecting optical paths from M FFMs to N PFMs, where M represents a positive integer and N represents an integer greater than M; for each of the combinations defined by the EUV mapping, summing up the aerial images corresponding to EUV point sources included in the combination, without performing an additional optical simulation for the combination; searching, from among the combinations defined by the EUV mapping, for a combination of the EUV point sources using a fitness value with respect to the summed aerial images, wherein the fitness value is calculated based on quantifying at least one of (i) optical indexes or (ii) performance indexes of patterning in an EUV light exposure process; and physically configuring the EUV illumination system by directing light from a plurality of FFMs along optical paths to a plurality of PFMs according to the combination of the EUV point sources having a maximum fitness value.

Facts

Company
Samsung (Samsung Electronics Co., Ltd.)
Official title
Method of configuring extreme ultra-violet (EUV) illumination system, and EUV exposure method using the EUV illumination system
Patent number
US12730382B2
Application number
18806848
Filed
Aug 16, 2024
Granted
Sep 8, 2026
Inventors
4
Claims
19

Classified under

G03F 7/70516 Physics & computingG03F 7/70504 Physics & computingG03F 7/70033 Physics & computing
Read the full filing (official PDF) ↗ Open in the Patent Tracker

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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.