Sony patents camera mask that uses rotational symmetry to guide light
Sony describes a mask for image capturing devices that uses a two-dimensional pattern to guide light to a sensor. The design features a symmetrical component that rotates around a specific reference point located within the pattern area.
In the filing’s own words
A mask includes a two-dimensional pattern including an optical amplitude modulation region or a phase modulation region having a symmetrical component that is symmetrical in a rotation direction about a preset rotation reference point, wherein the mask guides, based on the two-dimensional pattern, incident light to an image sensor. Additionally, the rotation reference point is set inside a pattern forming region where the two-dimensional pattern is provided.
What exactly they claim (claim 1)
1. A mask, comprising: a two-dimensional pattern including an optical amplitude modulation region or a phase modulation region having a symmetrical component that is symmetrical in a rotation direction about a preset rotation reference point, wherein the mask guides, based on the two-dimensional pattern, incident light to an image sensor.
Facts
- Company
- Sony (Sony Semiconductor Solutions Corporation)
- Official title
- MASK, IMAGE CAPTURING DEVICE, IMAGE CAPTURING SYSTEM, AND DATA GENERATION METHOD
- Publication number
- US20260323174A1
- Application number
- 19473804
- Filed
- Apr 15, 2024
- Published
- Oct 15, 2026
- Inventors
- 1
- Claims
- 20
Classified under
H04N 23/955 Electricity & electronicsG02B 5/003 Physics & computingG02B 26/06 Physics & computingMore from Sony in Cameras & imaging
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Summaries are simplified from the filing’s own abstract and first claim. A patent filing is not a product announcement.
Patent data and drawings: U.S. Patent and Trademark Office (USPTO). Nebula is not affiliated with or endorsed by the USPTO.
